A STUDY ON ELECTROLUMINESCENCE FROM <font>Au/Ge</font>-CONTAINING SILICON OXIDE/<font>p-Si</font> AND <font>Au/Si</font>-RICH SILICON OXIDE/<font>p-Si</font> STRUCTURES

S. Y. MA,Y. P. GUO,Y. Y. WANG,X. Q. LIU
DOI: https://doi.org/10.1142/s0218625x01001361
2001-01-01
Surface Review and Letters
Abstract:Ge-containing silicon oxide (GSO) films (5–15 nm) and Si-rich silicon oxide (SSO) films (5–15 nm) were deposited using the RF magnetron sputtering technique with a Ge–SiO 2 and a Si–SiO 2 composite target, respectively. The Au/GSO/p-Si and Au/SSO/p-Si structures were fabricated and their electroluminescence (EL) characteristics were comparatively studied. Both of the Au/GSO/p-Si and Au/SSO/p-Si structures have rectifying behavior. All the EL spectra from the two types of the structure have almost unchanged peak positions around 650 nm (~1.9 eV) and are independent of applied forward biases. The EL mechanisms for the Au/GSO/p-Si and Au/SSO/p-Si structures have been discussed.
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