Effects of Doping Al into SiO2 on Electroluminescence from Au/Nanometer (SiO2/Si/ SiO2)/p-Si Structure

王孙涛,陈源,张伯蕊,乔永萍,秦国刚,马振昌,宗婉华
DOI: https://doi.org/10.3321/j.issn:0253-4177.2001.02.011
2001-01-01
Abstract:The nanometer (SiO2/Si/SiO2)/p-Si and nanometer(SiO2∶Al/Si/SiO2∶Al)/p-Si structures with Si layers having twelve different thicknesses have been fabricated with the two-target alternative magnetron sputtering technique. The ratio of Al to SiO2 in the composite SiO2/Al target is 1∶99. The thickness of Si layers in both the structures is from 1nm to 3nm with an interval of 0.2nm.Samples with Si layer of 0nm are also made for comparison.These two structures having been annealing at 900℃ in N2 for 30min, thin Al films were deposited on the back of them to make good ohmic contacts,and then semitransparent Au films on the samples' front surfaces. At a forward bias, electroluminescence (EL) is observed from the Au/nanometer (SiO2/Si/SiO2)/p-Si and Au/nanometer (SiO2∶Al/Si/SiO2∶Al)/p-Si structures. It is found that the EL peak intensity, peak wavelength and current synchronously swing with the increasing Si layer thickness. But the EL intensity of Au/nanometer (SiO2∶Al/Si/SiO2∶Al)/p-Si structure is stronger than that of Au/nanometer (SiO2/Si/SiO2)/p-Si structure. And the swinging properties of the two structures are different. The EL mechanism of the two structures and the effects of doping Al into SiO2 layers have been discussed.
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