Microstructure And Properties Of Sol-Gel Pzt Thin Films With Buffer Layers

Jr Cheng,D Xu,Yp Ding,Xy Zhang,Zy Meng
2001-01-01
Abstract:Smart hetero-structures Pb(Zr,Ti)O-3(PZT)/NiTi multilayer thin films were fabricated on Si (100) substrates. Sol-gel techniques were used to prepare PZT layers. PbTiO3 and TiO2 buffer layers were introduced between PZT and NiTi thin films to improve the crystallity and dielectric properties of multi-layers. Results of experiments showed PZT/PT/TiO2/NiTi/Si(100) possess perovskite structure, and better comprehensive electrical properties after annealing at 550 degreesC for 30 min. Amorphous sputtering NiTi thin films had been crystallised to high temperature B-2 phase. The leak current density is 4.62 x 10(-9) A/cm(2) at the drive field of 15 kV/cm. The dielectric constant epsilon and dissipation factor are 413 and 0.013 at 1 KHz respectively. A remnant polarization of 0.52 uc/cm(2) and coercive field of 21.2 and -20.6 kV/cm were obtained for the 0.8 um thick film. AFM images of different multilayer structures hive obviously different grain morphology.
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