Influence of doping and buffer layers on Pb(Zr,Ti)O3 thin films derived from inorganic zirconium precursor

Qi-Yue Shao,Ai-Dong Li,Yue-Feng Tang,Hui-Qin Ling,Nai-Ben Ming
DOI: https://doi.org/10.1016/S0254-0584(02)00057-3
IF: 4.778
2002-01-01
Materials Chemistry and Physics
Abstract:The effects of doping and buffer layers on the structure and electrical properties of Pb(Zr,Ti)O3 (PZT) thin films on Pt/TiO2/SiO2/Si substrate derived from inorganic zirconium precursor have been studied. Ta doping optimizes the structure texture and reduces the leakage current of PZT films, whereas Ce-doped films have large amount of pyrochlor phase formed and a large leakage current. Dielectric measurement indicates that Ce and Ta doping can greatly change the dielectric constant of films. Doped and undoped PZT films exhibit an ohmic-like current even at high field. PbTiO3 (PT) and LaNiO3 (LNO) were used as PZT buffer layers on Pt/TiO2/SiO2/Si substrate. XRD patterns show that PT buffer layers can decrease the crystallization temperature of PZT films (by about 50°C). No pyrochlor phase was detected in PZT/PT and PZT/LNO films. Additionally, PZT/LNO films exhibit good fatigue characteristics compared with films directly deposited on Pt-coated Si substrate.
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