Properties of multi-layered PZT films

Xiangming Tao,Mingqiu Tan,Yuqing qing Xu,QiRui Zhang
1996-01-01
Abstract:An investigation was made experimentally on the properties of multi-layered PZT ferroelectric films deposited by RF magnetron sputtering. The results show that (1) the optimal processing conditions are: the substrate temperature Ts=650��C, the thickness of films is about 300nm, and with the MgO (100) single crystal or SiO2 (100) single crystal as the substrate are more suitable for the multi-layered PZT films; (2) the crystal is of partially oriented growth, and the domain is of 180�� type; (3) the thinner the film, the larger the dielectric constant and the relaxation frequency; (4) the insulation of the films is dominated by the interface between metal and PZT thin film; (5) the Shottky barrier and Fowler-Nordheim tunneling dominate the conduction mechanism respectively.
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