Effectof annealing temperature onthe propertiesof PZTferroelectric thinfilms inthe processof RTPwithSol-gel method

胡绍璐,赵海臣,李林华,任丽,邓朝勇
2014-01-01
Abstract:By Rapid thermal annealing process with the Sol - Gel method,the dense PZT ferroelectric thin films are prepared on Pt/TiO2/SiO2/ Si substrate ,and the influence of annealing temperature on the crystalline structure, surface morphology and fer-roelectric properties of thin films is studied when the annealing time is 500s. By X-ray diffraction (XRD), scanning electron microscopy (SEM) and ferroelectric tester, thin films are characterized. The results show that, PZT films with (111) preferred orientation, dense surface without cracks have good ferroelectric properties (the saturated polarization value with 30 C/cm2, the remaining polarization value with 20 C/cm2, the Coercive field value with 150KV/cm) ,when the annealing temperature is 6000 C; In 100KV/cm electric field, current density J is in 10-1 A/cm2 magnitude, indicating that the PZT nano-films have better qual-ity, and can withstand high field strength to reach the saturation polarization state without breakdown.
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