Simulation of TaOX-RRAM with Ta2O5−X/TaO2−Xstack engineering

YD Zhao,P Huang,Z Chen,C Liu,HT Li,WJ Ma,B Gao,XY Liu,JF Kang
2015-01-01
Abstract:An atomistic Monte-Carlo simulator of TaO X -based resistive random access memory (RRAM) with bi-layered Ta 2 O 5-X /TaO 2-X stack is developed by considering generation/recombination (G-R) of oxygen vacancies (V O ) with oxygen ions (O 2- ), phase transition (P-T) between Ta 2 O 5 and TaO 2 as well as interactions of Ta 2 O 5-X /TaO 2-X stack. The stack induced effects involving changeable Schottky barrier (SB) at the stack interface, the evolutions of O 2- and lattice oxygen (LO) in the stack and the self-compliance effect are also included in the simulator. Using the simulation tool, the resistive switching (RS) characteristics of the bi-layered TaO X -based RRAM can be reproduced. The impacts of different stack thicknesses, oxygen contents and capabilities to take redox reactions with O 2- of TaO 2-X layer on RS behaviors are simulated. The simulation results can be utilized to achieve controllable …
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