Abstract:Tantalum oxynitride (TaOxNy) thin films were prepared in a RF magnetron sputtering system. The film properties with various sputtering parameters such as RF power, gases ratio, and substrate temperatures were investigated. In comparison with tantalum oxide films, the film properties are strongly affected by the nitrogen content. The microstructure studied by XRD and TEM revealed amorphous. When the nitrogen content varied from 20 % to 80 %, the deposition rates increase from 5.5 to 11.8 nm/min. Because of the stronger affinity of oxygen to Ta than nitrogen does, the oxygen content of the films is always higher than nitrogen content, even if the partial pressure of nitrogen is higher than that of oxygen. The highest refractive index (n) of the tantalum oxynitride film is 2.29 and the extinction coefficient (k) is nearly zero. The refractive index is inversely proportional to the substrate temperature. The mean square surface roughnesses measured by SPM (scanning probe microscopy) for as-deposited at room temperature and 300 degreesC were 0.56 nm and 0.17nm, respectively. By way of a micro-electro-mechanical-system (MEMs) technique - the cantilever beam method, the films show a compressive residual-stress state and the coefficient of thermal expansion (CTE) is also measured. The thermal properties were deeply affected by the nitrogen. Thus, TaOxNy films with suitable x, y values are good candidate dielectric materials for optical or magneto-optical purposes.

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Preparation and Characterization of Tantalum-Doped Indium Tin Oxide Films Deposited by Magnetron Sputtering

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AFM Study on the Surface Morphologies of TiN Films Prepared by Magnetron Sputtering and Al2O3 Films Prepared by Atomic Layer Deposition

XPS analysis and electrical conduction mechanisms of atomic layer deposition grown Ta2O5 thin films onto p-Si substrates

Electrical characterization of Ta2O5 films deposited by laser reactive ablation of metallic Ta

Deposition of Tantalum Oxide Films by Uv Laser Reactive Ablation in O-3 Ambient

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Characterization of High Quality Tantalum Pentoxide Film Synthesized by Oxygen Plasma Enhanced Pulsed Laser Deposition

Study of the crystalline and optical properties of lithium tantalate thin films deposited by high power RF magnetron sputtering

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