Abstract:Tantalum electrolytic capacitors have performance advantages of long life, high temperature stability, and high energy storage capacity and are essential micro-energy storage devices in many pieces of military mechatronic equipment, including penetration weapons. The latter are high-value ammunition used to strike strategic targets, and precision in their blast point is ensured through the use of penetration fuzes as control systems. However, the extreme dynamic impact that occurs during penetration causes a surge in the leakage current of tantalum capacitors, resulting in a loss of ignition energy, which can lead to ammunition half-burst or even sometimes misfire. To address the urgent need for a reliable design of tantalum capacitor for penetration fuzes, in this study, the maximum acceptable leakage current of a tantalum capacitor during impact is calculated, and two different types of tantalum capacitors are tested using a machete hammer. It is found that the leakage current of tantalum capacitors increases sharply under extreme impact, causing functional failure. Considering the piezoresistive effect of the tantalum capacitor dielectric and the changes in the contact area between the dielectric and the negative electrode under pressure, a force–electric simulation model at the microscale is established in COMSOL software. The simulation results align favorably with the experimental results, and it is anticipated that the leakage current of a tantalum capacitor will experience exponential growth with increasing pressure, ultimately culminating in complete failure according to this model. Finally, the morphological changes in tantalum capacitor sintered cells both without pressure and under pressure are characterized by electron microscopy. Broken particles of Ta–Ta2O5 sintered molecular clusters are observed under pressure, together with cracks in the MnO2 negative base, proving that large stresses and strains are generated at the micrometer scale.

I-V Characteristics of Tantalum Oxide Film and the Effect of Defects on Its Electrical Properties

I-V Characteristics of High Dielectric Constant Tantalum Oxide Films

Influence of Capability of Ta_2O_5 Dielectric Film on Performance of Wet Tantalum Electrolytic Capacitor

Influence of Ta and TaN Bottom Electrodes on Electrical Performances of MIM Capacitors with Atomic-Layer-deposited HfO2 Dielectric

XPS analysis and electrical conduction mechanisms of atomic layer deposition grown Ta2O5 thin films onto p-Si substrates

The Variation of the Leakage Current Characteristics of W/Ta2O5/W MIM Capacitors with the Thickness of the Bottom W Electrode

Electrical characterization of Ta2O5 films deposited by laser reactive ablation of metallic Ta

Characteristics of Tantalum Oxynitride Films Prepared by Rf Magnetron Sputtering

Deposition of Tantalum Oxide Films by Uv Laser Reactive Ablation in O-3 Ambient

AFM Study on the Surface Morphologies of TiN Films Prepared by Magnetron Sputtering and Al2O3 Films Prepared by Atomic Layer Deposition

High Density Al2O3/TaN-based Metal–insulator–metal Capacitors in Application to Radio Frequency Integrated Circuits

Dielectric Properties Investigation of Metal–Insulator–Metal (MIM) Capacitors

C-V and Dlts Studies of Al/Ta2o5/N-Si Structures with Ta2o5 Thin Films Deposited by Pulsed Laser Deposition

Demonstration and Characterization of 500 V MIM Capacitor with Al2O3 Dielectric Layer for Power Integrated Circuits

Improvement of Voltage Linearity and Leakage Current of MIM Capacitors with Atomic Layer Deposited Ti-Doped ZrO2 Insulators

Formation and Electric Property Measurement of Nanosized Patterns of Tantalum Oxide by Current Sensing Atomic Force Microscope

Tuning of Electrical and Optical Properties of Tantalum Doped TiO2 Flims Prepared by Sol-gel Method

Characterization of Metalorganic Decomposition-Derived SrBi2Ta2O9 Thin Films with Different Thicknesses

Initial electrical properties of tantalum oxide resistive memories influenced by oxygen defect concentrations

Insights into the breakdown mechanism of anodic oxide film

Failure behavior of tantalum electrolytic capacitors under extreme dynamic impact: Mechanical–electrical model and microscale characterization