FEM Simulation of the Uniformity of the Thickness of the MEMS Microstructure Electrodeposition

汤俊,汪红,刘瑞,毛胜平,李雪萍,王志民,丁桂甫
2008-01-01
Abstract:The electric field of Ni microelectroforming is simulated by the Finite Element Method Software(ANSYS).The effect of the thickness of the photoresist,line width and parameter of the auxiliary electrodes on the uniformity of the microstructure is analyzed carefully.Furthermore,the effects of size of the microstructure unit,the distance and size of the auxiliary electrodes on the uniformity of microelectroforming are studied by the electrodeposited experiments according to the simulated results.The simulated and experimental results indicate that size of the microstructure unit is one of the most important factors on the uniformity of microelectroforming.Moreover,the method of adding auxiliary electrodes is an effective way to improve the uniformity of the thickness of the microelectroforming,and FEM is an effective way to simulate the electroforming process.
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