Abstract:Near-surface nanoscale damage precursor generated from the fabrication process has great influence on laser-induced damage threshold improvement of fused silica. In this work, high-resolution transmission electron microscopy (HRTEM) is used to characterize the arrangement of material particles near surface. The nanoscale defects in the Beilby layer could be clearly distinguished. And we find ion beam etching (IBE) has little effect on the arrangement of material particles. This microscopic phenomenon makes IBE a promising technique for the detection of nanoscale near-surface damage precursors. To further investigate the nanoscale near-surface damage after chemical mechanical polishing, a trench is generated by ion sputtering to contain the nature and characteristics of nanoscale precursors in different depths. The evolutions of chemical structure defects and nanoparticles are measured and their laser-induced absorption performance are tested. The results show that there is a nanoscale defect layer (~360nm) beneath the Beilby layer. A model for nanoscale defect layer of fused silica after CMP is offered. In the model, the quantitative density of nanoparticles falls exponentially with increasing the depth and the contents of ODC and NBOHC decreases linearly, respectively. Research results can be a reference on characterizing nanoscale defects near surface and conducting post-processing technologies to improve the laser damage resistance property of fused silica.

Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Investigation of surface characteristics evolution and laser damage performance of fused silica during ion-beam sputtering

Effect of ion beam etching on surface/subsurface structural defect evolution in fused silica optics

Investigation of Laser-Induced Damage Threshold Improvement Mechanism During Ion Beam Sputtering of Fused Silica

Effects Of Ion Beam Etching On The Nanoscale Damage Precursor Evolution Of Fused Silica

Recovery of fused silica surface damage resistance by ion beam etching

Anisotropic Ion Beam Etching Of Fused Silica To Mitigate Subsurface Damage

Detailed Near-Surface Nanoscale Damage Precursor Measurement and Characterization of Fused Silica Optics Assisted by Ion Beam Etching

Combined Etching Technology for Controlling Surface Damage Precursors to Improve Laser Damage Resistance of Fused Silica

Combination of scanning ion beam etching and dynamic chemical etching for improving laser damage resistance of fused silica optics

Investigation of Grinding and Lapping Surface Damage Evolution of Fused Silica by Inductively Coupled Plasma Etching

A two-step physical-chemical etching technique to improve laser damage resistance of fused silica

Layer by layer exposure of subsurface defects and laser-induced damage mechanism of fused silica

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Improving Uv Laser Damage Threshold Of Fused Silica Optics By Wet Chemical Etching Technique

Reaction ion etching process for improving laser damage resistance of fused silica optical surface

Optical characterization and laser damage of fused silica optics after ion beam sputtering

Influence Mechanism of Plasma Cleaning and Ion Beam Figuring on the Intrinsic Surface of Fused Silica

Evolution of physical and mechanical properties of fused silica after subsurface damage layer removal by RIE treatment

Analysis and Experimental Investigation of Laser Induced Damage of Optics