Abstract:Laser-induced damage on fused silica optics remains a major issue that limits the promotion of energy output of large laser systems. Subsurface impurity defects inevitably introduced in the practical polishing process incur strong thermal absorption for incident lasers, seriously lowering the laser-induced damage threshold (LIDT). Here, we simulate the temperature and thermal stress distributions involved in the laser irradiation process to investigate the effect of impurity defects on laser damage resistance. Then, HF-based etchants (HF:NH4F) are applied to remove the subsurface impurity defects and the surface quality, impurity contents and laser damage resistance of etched silica surfaces are tested. The results indicate that the presence of impurity defects could induce a dramatic rise of local temperature and thermal stress. The maximum temperature and stress can reach up to 7073 K and 8739 MPa, respectively, far higher than the melting point and compressive strength of fused silica, resulting in serious laser damage. The effect of impurity defects on laser damage resistance is dependent on the species, size and spatial location of the defects, and CeO2 defects play a dominant role in lowering the LIDT, followed by Fe and Al defects. CeO2 defects with radius of 0.3 μm, which reside 0.15 μm beneath the surface, are the most dangerous defects for incurring laser damage. By HF acid etching, the negative effect of impurity defects on laser damage resistance could be effectively mitigated. It is validated that with HF acid etching, the number of dangerous CeO2 defects is decreased by more than half, and the LIDT could be improved to 27.1 J/cm2.

Analysis and Experimental Investigation of Laser Induced Damage of Optics

Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with Hf Acid Etching

Subsurface Damage Properties of Nano Scratches in Fused Silica Optics

Investigation of Subsurface Damage Density and Morphology Impact on the Laser-Induced Damage Threshold of Fused Silica

Characterization of artificial indentation defects in fused silica surface and its damage performance under 355 nm nanosecond laser

Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.

Investigation on the influence of the CO2 laser parameters on the defect healing process of fused silica

Investigation of Grinding and Lapping Surface Damage Evolution of Fused Silica by Inductively Coupled Plasma Etching

Morphological and Damage Growth Characteristics of Shell-Type Damage of Fused Silica Optics Induced by Ultraviolet Laser Pulses.

Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Effect of Etching Morphology of Artificial Defect on Laser-Induced Damage Properties under 355 Nm Laser Irradiation.

Characterization of laser damage performance of fused silica using photothermal absorption technique

Experiment of Laser Induced Damage Threshold for Different Sub-Surface Cracks on Fused Silica

Investigation of the Multimechanism Laser Cleaning Dynamics for Rough Fused Silica Surfaces with Organic Contaminants: A Computational Simulation and Atomic Analysis.

Laser-Induced Damage Growth on Larger-Aperture Fused Silica Optical Components at 351 Nm

Ab Initio Molecular Dynamics Simulation of the Effect of Impurities on Laser-Induced Damage of Fused Silica

Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics

Theoretical and Experimental Research on Laser-Induced Damage of Fused Silica Optics Due to Stimulated Brillouin Scattering

The Light Modulation Of Scratches On The Surface Of Fused Silica Glass

Investigation of surface characteristics evolution and laser damage performance of fused silica during ion-beam sputtering