Abstract:Ultraviolet (UV) laser-induced damage from defects and impurities in conventional ground and polished fused silica optics significantly hinders their application in high-power laser systems. Laser cleaning, as a non-contact and polishing fluid-free technology, is likely to be a key technology for improving the damage performance of fused silica optics. However, conventional laser cleaning primarily focuses on surface pollution without removing the material. It overlooks the detrimental effects of multiscale defects and impurities inside the fused silica. In this study, microsecond-pulsed CO2 laser cleaning was proposed to enhance the laser-induced damage threshold (LIDT) by ablating fused silica to nanometer depths. Through multiple-scale simulations, the thermal stress evolution and modulation mechanism of defects and impurities on the damage performance (ranging from the macro- to nanoscale) were revealed. Utilizing multimodal characterization, laser cleaning effectively eliminated and suppressed surface/subsurface defects, absorptive defects, chemical structural defects, and elemental impurities without introducing residual thermal stress and destroying surface roughness. In addition, the evolution of the molecular structures indicated a tendency for intrinsic defects to recombine into shorter-ring structures, which resulted in a densified fused silica surface. The laser-cleaned samples exhibited higher damage thresholds, achieving 47.6 % (0 % probability) and 27.0 % (100 % probability) improvements compared with uncleaned samples. This technology provides a new method for fabricating high damage threshold fused silica optics with superior surface quality for high-power laser applications.

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Improving Uv Laser Damage Threshold Of Fused Silica Optics By Wet Chemical Etching Technique

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with Hf Acid Etching

The Influence of Etching Depth on Surface Molecular Structures and Laser Damage Thresholds of Fused Silica by using Megasonic-assisted HF-based Etching

The Infrared Spectra and Laser Damage Threshold of the Fused Silica after Megacoustic Field Assisted Hydrofluoric-Based Etching

Effect of HF etching on the surface quality and laser-induced damage of fused silica

Improve the Laser Damage Resistance of Fused Silica by Wet Surface Cleaning and Optimized HF Etch Process

Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching

Laser Induced Damage in Fused Silica for 248 nm

Effects of Acid-Etching Depth on 355 Nm Laser-Induced Damage Threshold of Fused Silica

Surface Molecular Structure Defects and Laser-Induced Damage Threshold of Fused Silica During a Manufacturing Process

Evolution of physical and mechanical properties of fused silica after subsurface damage layer removal by RIE treatment

A two-step physical-chemical etching technique to improve laser damage resistance of fused silica

Enhancement of laser induced damage threshold of fused silica by acid etching combined with UV laser conditioning

Repair of Fused Silica Damage Using Selective Femtosecond Laser-Induced Etching

Ab Initio Molecular Dynamics Simulation of the Effect of Impurities on Laser-Induced Damage of Fused Silica

Combined Etching Technology for Controlling Surface Damage Precursors to Improve Laser Damage Resistance of Fused Silica

Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.

Microsecond-pulsed CO2 laser cleaning of high damage threshold fused silica