Abstract:Timely repair of fused silica damage ensures the stable operation of high-power laser systems. In the traditional repair process, the material nearby the damaged area is gradually ablated with CO2 or femtosecond laser. Subsequently, homogenization and residual stress removal are required because of the microcracks and thermal accumulation generated with the ablation. As a result, the repair efficiency is greatly restricted. In this paper, a new method using in-volume, selective femtosecond laser-induced etching to repair the damage of fused silica is proposed. The region irradiated by femtosecond laser becomes more susceptible to the etching solution due to its constitutive characteristics having undergone chemical restructuring. In this way, material nearby the damaged area transparent to the laser radiation is modified locally inside the volume. A femtosecond laser is used to scan the damaged area with a 3D hollow trajectory. The applicable modification of fused silica occurs when the single pulse energy is approximately 2 μJ to 5 μJ, the repetition frequency is approximately 200 kHz to 500 kHz, and the scanning speed is approximately 10 mm/s. Then, the etching solution reacts quickly along the 3D profile of the modified path, and the damaged area is removed as a whole piece. This method can greatly reduce the workload of repair, and the etching process of fused silica is carried out synchronously. So, the etching efficiency is not affected by the number of damage points. In addition, the weak reaction between the etching solution and the substrate could homogenize the interface. It provides an efficient way to repair the surface damage of fused silica.

The Infrared Spectra and Laser Damage Threshold of the Fused Silica after Megacoustic Field Assisted Hydrofluoric-Based Etching

The Influence of Etching Depth on Surface Molecular Structures and Laser Damage Thresholds of Fused Silica by using Megasonic-assisted HF-based Etching

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Improving Uv Laser Damage Threshold Of Fused Silica Optics By Wet Chemical Etching Technique

Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with Hf Acid Etching

Effect of HF etching on the surface quality and laser-induced damage of fused silica

Surface Molecular Structure Defects and Laser-Induced Damage Threshold of Fused Silica During a Manufacturing Process

Laser Induced Damage in Fused Silica for 248 nm

Enhancement of laser induced damage threshold of fused silica by acid etching combined with UV laser conditioning

Effects of Acid-Etching Depth on 355 Nm Laser-Induced Damage Threshold of Fused Silica

Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.

Recovery of fused silica surface damage resistance by ion beam etching

Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics

Repair of Fused Silica Damage Using Selective Femtosecond Laser-Induced Etching

Experimental study on HF etching of fused silica

Improve the Laser Damage Resistance of Fused Silica by Wet Surface Cleaning and Optimized HF Etch Process

Laser-Induced Damage on Fused Silica with Photo-Acoustic Spectrum Analysis

The Photo-Thermal Absorbing Influence on Introducing Laser-Damaging of the Fused Silica

Combined Etching Technology for Controlling Surface Damage Precursors to Improve Laser Damage Resistance of Fused Silica