Abstract:Oxygen ions (O + ) were implanted into fused silica at a fixed fluence of 1 × 10 17 ions/cm 2 with different ion energies ranging from 10 keV to 60 keV. The surface roughness, optical properties, mechanical properties and laser damage performance of fused silica were investigated to understand the effect of oxygen ion implantation on laser damage resistance of fused silica. The ion implantation accompanied with sputtering effect can passivate the sub-/surface defects to reduce the surface roughness and improve the surface quality slightly. The implanted oxygen ions can combine with the structural defects (ODCs and E′ centers) to reduce the defect densities and compensate the loss of oxygen in fused silica surface under laser irradiation. Furthermore, oxygen ion implantation can reduce the Si–O–Si bond angle and densify the surface structure, thus introducing compressive stress in the surface to strengthen the surface of fused silica. Therefore, the laser induced damage threshold of fused silica increases and the damage growth coefficient decreases when ion energy up to 30 keV. However, at higher ion energy, the sputtering effect is weakened and implantation becomes dominant, which leads to the surface roughness increase slightly. In addition, excessive energy aggravates the breaking of Si–O bonds. At the same time, the density of structural defects increases and the compressive stress decreases. These will degrade the laser laser-damage resistance of fused silica. The results indicate that oxygen ion implantation with appropriate ion energy is helpful to improve the damage resistance capability of fused silica components.

Investigation of surface characteristics evolution and laser damage performance of fused silica during ion-beam sputtering

Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.

Investigation of Laser-Induced Damage Threshold Improvement Mechanism During Ion Beam Sputtering of Fused Silica

Optical characterization and laser damage of fused silica optics after ion beam sputtering

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Influence Mechanism of Plasma Cleaning and Ion Beam Figuring on the Intrinsic Surface of Fused Silica

Effect of ion beam etching on surface/subsurface structural defect evolution in fused silica optics

Recovery of fused silica surface damage resistance by ion beam etching

Anisotropic Ion Beam Etching Of Fused Silica To Mitigate Subsurface Damage

Investigation of Grinding and Lapping Surface Damage Evolution of Fused Silica by Inductively Coupled Plasma Etching

Effects Of Ion Beam Etching On The Nanoscale Damage Precursor Evolution Of Fused Silica

Evolution of physical and mechanical properties of fused silica after subsurface damage layer removal by RIE treatment

Reaction ion etching process for improving laser damage resistance of fused silica optical surface

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Surface Defects, Stress Evolution, and Laser Damage Enhancement Mechanism of Fused Silica under Oxygen-Enriched Condition

Detailed Near-Surface Nanoscale Damage Precursor Measurement and Characterization of Fused Silica Optics Assisted by Ion Beam Etching

Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

Analysis and Experimental Investigation of Laser Induced Damage of Optics

Evolution Mechanism of Surface Roughness During Ion Beam Sputtering of Fused Silica.

Morphology evolution of fused silica surface during ion beam figuring of high-slope optical components

Detailed Subsurface Damage Measurement And Efficient Damage-Free Fabrication Of Fused Silica Optics Assisted By Ion Beam Sputtering