Abstract:Laser-induced damage on fused silica optics remains a major issue that limits the promotion of energy output of large laser systems. Subsurface impurity defects inevitably introduced in the practical polishing process incur strong thermal absorption for incident lasers, seriously lowering the laser-induced damage threshold (LIDT). Here, we simulate the temperature and thermal stress distributions involved in the laser irradiation process to investigate the effect of impurity defects on laser damage resistance. Then, HF-based etchants (HF:NH4F) are applied to remove the subsurface impurity defects and the surface quality, impurity contents and laser damage resistance of etched silica surfaces are tested. The results indicate that the presence of impurity defects could induce a dramatic rise of local temperature and thermal stress. The maximum temperature and stress can reach up to 7073 K and 8739 MPa, respectively, far higher than the melting point and compressive strength of fused silica, resulting in serious laser damage. The effect of impurity defects on laser damage resistance is dependent on the species, size and spatial location of the defects, and CeO2 defects play a dominant role in lowering the LIDT, followed by Fe and Al defects. CeO2 defects with radius of 0.3 μm, which reside 0.15 μm beneath the surface, are the most dangerous defects for incurring laser damage. By HF acid etching, the negative effect of impurity defects on laser damage resistance could be effectively mitigated. It is validated that with HF acid etching, the number of dangerous CeO2 defects is decreased by more than half, and the LIDT could be improved to 27.1 J/cm2.

Layer by layer exposure of subsurface defects and laser-induced damage mechanism of fused silica

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Anisotropic Ion Beam Etching Of Fused Silica To Mitigate Subsurface Damage

Effect of ion beam etching on surface/subsurface structural defect evolution in fused silica optics

Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.

A two-step physical-chemical etching technique to improve laser damage resistance of fused silica

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Investigation of Laser-Induced Damage Threshold Improvement Mechanism During Ion Beam Sputtering of Fused Silica

Detailed Near-Surface Nanoscale Damage Precursor Measurement and Characterization of Fused Silica Optics Assisted by Ion Beam Etching

Recovery of fused silica surface damage resistance by ion beam etching

Effects Of Ion Beam Etching On The Nanoscale Damage Precursor Evolution Of Fused Silica

Combination of scanning ion beam etching and dynamic chemical etching for improving laser damage resistance of fused silica optics

Enhancement of laser induced damage threshold of fused silica by acid etching combined with UV laser conditioning

Surface Molecular Structure Defects and Laser-Induced Damage Threshold of Fused Silica During a Manufacturing Process

Combined Etching Technology for Controlling Surface Damage Precursors to Improve Laser Damage Resistance of Fused Silica

Reaction ion etching process for improving laser damage resistance of fused silica optical surface

Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with Hf Acid Etching

Surface Defects, Stress Evolution, and Laser Damage Enhancement Mechanism of Fused Silica under Oxygen-Enriched Condition

The Influence of Etching Depth on Surface Molecular Structures and Laser Damage Thresholds of Fused Silica by using Megasonic-assisted HF-based Etching

Ab Initio Molecular Dynamics Simulation of the Effect of Impurities on Laser-Induced Damage of Fused Silica

Improving Uv Laser Damage Threshold Of Fused Silica Optics By Wet Chemical Etching Technique