Comprehensive Understanding of Charge Lateral Migration in 3d Sonos Memories

Lifang Liu,Antonio Arreghini,Geert Van den Bosch,Liyang Pan,Jan Van Houdt
DOI: https://doi.org/10.1016/j.sse.2015.11.036
IF: 1.916
2016-01-01
Solid-State Electronics
Abstract:The effects and mechanisms responsible for charge lateral migration in 3D SONOS devices are studied in detail. We evaluated the electron lateral migration at room temperature and at 150 degrees C in 3D SONOS devices. Through interpretation of measurements and simulations, we found that lateral migration shows similar emission rates of Poole-Frenkel effect and therefore it is linked to the same trap energy profile. This feature should be included in a model to properly simulate 3D SONOS retention transients. Further experiments and simulations show no influence of SiN thickness nor P/E cycles on lateral migration. (C) 2015 Elsevier Ltd. All rights reserved.
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