Hopping Conduction in Partially Compensated Doped Silicon.

J ZHANG,W CUI,M JUDA,D MCCAMMON,RL KELLEY,SH MOSELEY,CK STAHLE,AE SZYMKOWIAK
DOI: https://doi.org/10.1103/physrevb.48.2312
1993-01-01
Abstract:We have measured the dc electrical resistance of partially compensated (5-50%)_ion-implanted Si:P,B (both n and p type), over the temperature range 0.05-30 K. The temperature behavior is consistent with the prediction of the model for variable-range hopping (VRH) with a Coulomb gap rho(T)=rho0exp(T0/T)1/2 over a temperature range 6.5 < T0/T < 24. We observe deviations from this behavior at our high- and low-temperature extremes. In the low-temperature region, the resistivities show a stronger temperature dependence than the Coulomb-gap model prediction. The high-temperature deviation appears consistent with a transition from Coulomb-gap VRH to Mott VRH.
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