Characterization and Failure Analysis of Sub-10 Nm Diameter, Gate-All-around Nanowire Field-Effect Transistors Subject to Electrostatic Discharge (ESD)

Liu, W.,Liou, J.J.,Singh, N.,Lo, G.Q.
DOI: https://doi.org/10.1109/inec.2011.5991616
2011-01-01
Abstract:Electrostatic discharge (ESD) robustness of the Sub-10 nm diameter gate-all-around nanowire field-effect transistor (NW FET) was characterized and compared with sub 65nm MOS devices and FinFETs. Failure mechanisms of NW FETs subject to ESD stresses are investigated by DC current-voltage measurements carried out before and after stressing the devices with ESD equivalent pulses generated from the transmission line pulsing (TLP) tester.
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