Room Temperature Resonant Tunneling and Negative Differential Resistance Effects in a Self-Assembed Si Quantum Dot Array

Linwei Yu,Kunji Chen,Jie Song,Jiumin Wang,Xiang Wang,Wei Li,Xinfan Huang
DOI: https://doi.org/10.3321/j.issn:0253-4177.2006.z1.004
2006-01-01
Abstract:We report the room temperature resonant tunneling and negative differential resistance (NDR) effects in a self-assembled Si quantum dot (Si-QDs) array. The double-layer structure of Al/SiO2/Si-QDs/SiO2/p-Si substrate is fabricated by layer-by-layer deposition and in situ plasma oxidation in a plasma-enhanced chemical vapor deposition (PECVD) system. Obvious NDR effects are directly observed in the current-voltage characteristics,and similar peak structures at the same voltage are also identified in the capacitance-voltage characteristics. Both of them are attributed to the resonant tunneling and charging dynamics in the Si-QD array. Moreover, the major features, such as the scan-rate and scan-direction dependences of the peak structure, are investigated, and the underlying mechanism is found to be quite different from that of a quantum well structure. Based on a master-equation numerical model,the resonant tunneling and charging dynamics together with the unique features can be satisfactorily explained and reproduced.
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