Temperature dependence of strain in AlxGa1-xN/GaN heterostructures

Chen, D.J.,Shen, B.,Zhang, K.X.,Tao, Y.Q.
DOI: https://doi.org/10.1109/SIM.2005.1511387
2004-01-01
Abstract:The temperature dependence of strain in a 50-nm- and a 100-nm-thick Al0.2Ga0.8N/GaN heterostructures were investigated at temperatures 300-800 K. The results show that the temperature behavior of the in-plane strain in the 50-nm-thick AlGaN layer is different to that in the 100-nm-thick AlGaN layer. There exists an initial energy barrier to the strain relaxation for the 50-nm-thick Al0.22Ga0.78N/GaN heterostructure. Meanwhile, for both the 50-nm-and 100-nm-thick AlGaN layers the strain relaxation becomes saturated at the high temperature segment, although the temperature at the point of saturation is different. The total strain relaxation is less than 5% for both the 50-nm- and 100-nm-thick Al0.22Ga0.78N layers at whole temperature range in our measurements.
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