MICROSTRUCTURES AND STRAIN RELAXATION IN MODULATION-DOPED <font>Al</font><sub>x</sub><font>Ga</font><sub>1-x</sub><font>N</font>/<font>GaN</font> HETEROSTRUCTURES

W. S. TAN,B. SHEN,H. SHA,H. L. CAI,X. S. WU,Y. D. ZHENG,S. S. JIANG,W. L. ZHENG,Q. J. JIA,Q. HE
DOI: https://doi.org/10.1142/s0217979204024021
2004-01-01
International Journal of Modern Physics B
Abstract:Modulation-doped Al 0.22 Ga 0.78 N / GaN heterostructures with various thickness of Si-doped Al 0.22 Ga 0.78 N barrier (n- AlGaN ) were deposited on (0001)-oriented sapphire (α- Al 2 O 3) by atmosphere-pressure metal-organic chemical vapor deposition (MOCVD). The reciprocal space mappings (RSMs) of symmetric reflection (0002) and asymmetric reflection [Formula: see text] were measured by means of the high resolution X-ray diffraction (HRXRD). The results indicate that the microstructures and the strain status of the n- AlGaN barrier correlate to those of the underlying i- GaN layer. The strained n- AlGaN barrier starts to relax when its thickness is 75 nm. It is found that there exists an "abnormal" relaxation state (the strain parameter γ>1) in modulation-doped Al 0.22 Ga 0.78 N / GaN heterostructures, which maybe results from the internal defects in Al 0.22 Ga 0.78 N barrier and the strain relaxation status at the i- GaN /α- Al 2 O 3 interfaces.
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