X-ray Diffraction Studies on AlGaN/GaN Heterostructures

谭伟石,徐金,蔡宏灵,沈波,吴小山,蒋树声,郑文莉,贾全杰
DOI: https://doi.org/10.3321/j.issn:0253-3219.2004.06.004
2004-01-01
Nuclear Techniques
Abstract:A modulation-doped AlxGa1-xN/GaN heterostructure with 1000? Si-doped n-Al0.22Ga0.78N barrier ( n-AlGaN ) was deposited on ( 0001 ) -oriented sapphire( α-Al2O3 ) by metal-organic chemical vapor deposition ( MOCVD ) . The reciprocal space mappings ( RSMs ) of symmetric reflection ( 0002 ) and asymmetric reflection ( 1014 ) were measured with the method of high resolution X-ray diffraction ( HRXRD ) . The results indicate that the microstructure and strain status of the barrier correlate to those of the i-GaN layer. The barrier holds an “abnormal” strain-relaxation status, which probably results from the internal defects of n-AlGaN and the strain relaxation status at the i-GaN/α-Al2O3 interfaces. The results from grazing incidence X-ray diffraction show that the strain in barrier is nonuniform, which is consistent with the results from the reciprocal space mappings.
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