Microstrain in Modulation-Doped AlxGa1-xN/GaN Heterostructures

谭伟石,沙昊,沈波,蔡宏灵,吴小山,蒋树声,郑文莉,贾全杰,姜晓明
DOI: https://doi.org/10.3321/j.issn:0253-3219.2002.10.008
2002-01-01
Nuclear Techniques
Abstract:Modulation-doped Al x Ga 1- x N/GaN heterostructures with various thickness of Si-doped n-Al 0.22 Ga 0.78 N barrier (n-AlGaN) were deposited on (0001)-oriented sapphire (α-Al 2O 3) by MOCVD. The reciprocal space mappings (RSMs) of symmetric reflection (0002) and asymmetric reflection (1014) were measured with the methods of high resolution X-ray diffraction (HRXRD). The results indicate that the microstructure and strain status of barrier correlate to those of the i-GaN layer. The strained barrier starts to be relaxed while its thickness is larger than 750 and the critical thickness t c is larger than 500. The barrier holds an abnormal relaxation status, which probably results from the internal defects of n-AlGaN and the strain relaxation status at the i-GaN/α-Al 2O 3 interfaces.
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