Structures and properties of Zr-N films prepared ECR-microwave plasma enhanced sputtering

Tianwei Liu,XinLü Deng,Xiaoying Wang,Yingmin Wang,Chuang Dong

2004-01-01

Abstract:ZrN thin films were prepared on #45 steel by using ECR-microwave plasma enhanced DC magnetron sputtering. An increase in the N2 flow leads to phase transitions from ZrN to both ZrN and ZrNx and to amorphous state. As N2 flow is 2 - 8 sccm, the films contain pure ZrN. When N2 flow is 10 - 12 sccm, both ZrN and the orthorhombic ZrNx (a=0.3585 nm, b=0.4443 nm, c=0.5798 nm) are observed. The film shows a strong tendency towards amorphous state at N2 flow reaching 14. The N concentration of the samples varies from 7.73% to 66.96% by Auger electron spectroscope (AES) and electron probe analyses. The surface microhardness of the samples, varying from 19.82 GPa to 26.32 GPa, first increases and then decreases with increasing of N2 flow. The hardest sample has a wear rate about 4.5×10-5 mg/min. The changes of hardness can be explained by the change of film structure due to different N2 flow.