Structure and mechanical properties of CrN thick films deposited by high-rate medium-frequency magnetron sputtering

Chuansheng Liu,Hongjun Wang,Lin Zhou,Rui Zhang,CanXin Tian,Ming Li,Dejun Fu,刘传胜,王红军,周霖,张瑞,田灿鑫,黎明,付德君
DOI: https://doi.org/10.1088/1009-0630/12/4/12
2010-01-01
Abstract:A home-made electron source assisted medium-frequency (MF) magnetron sputtering system was used to deposit thick CrN films on silicon and tungsten carbide substrates at various nitrogen flow rates with a fixed total pressure (0.3 Pa) and MF power (11.2 kW). Result from scanning electron microscopy showed that the deposited CrN films have clear columnar structure, and X-ray diffraction revealed a preferred orientation of CrN (200) for samples prepared at a rate of N-2/(N-2+Ar) below 60%, whereas those prepared at higher N-2/(N-2+Ar) rate are dominated by Cr2N. Deposition rates upto 12.5 mu m/h were achieved and the hardness of the CrN coatings were in a range of 11 GPa to 18 GPa.
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