Structural and Mechanical Properties of Multi-Element (alcrmotatizr)nx Coatings by Reactive Magnetron Sputtering

Keng-Hao Cheng,Chia-Han Lai,Su-Jien Lin,Jien-Wei Yeh
DOI: https://doi.org/10.1016/j.tsf.2010.11.034
IF: 2.1
2010-01-01
Thin Solid Films
Abstract:(AlCrMoTaTiZr)Nx high-entropy films were deposited on silicon wafer and cemented carbide substrates from a single alloy target by reactive RF magnetron sputtering under a mixed atmosphere of Ar and N2. The effect of nitrogen flow ratio RN on chemical composition, morphology, microstructure, and mechanical properties of the (AlCrMoTaTiZr)Nx films was investigated. Nitrogen-free alloy film had an amorphous structure, while nitride films with at least 37at.% N exhibited a simple NaCl-type FCC (face-centered cubic) structure. Mixed structures occurred in films with lower nitrogen contents. Films with the FCC structure were thermally stable without phase decomposition at 1000°C after 10h. The (AlCrMoTaTiZr)N film deposited at RN=40% exhibited the highest hardness of 40.2GPa which attains the superhard grade. The main strengthening mechanisms for this film were grain-size and solid-solution strengthening. A residual compressive stress of 1.04GPa was small to account for the observed hardness. The nitride film was wear resistant, with a wear rate of 2.8×10−6mm3/Nm against a loaded 100Cr6 steel ball in the sliding wear test. These high-entropy films have potential in hard coating applications.
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