Structure and Properties of Two Al–Cr–Nb–Si–Ti High-Entropy Nitride Coatings

Ming-Hsiao Hsieh,Ming-Hung Tsai,Wan-Jui Shen,Jien-Wei Yeh
DOI: https://doi.org/10.1016/j.surfcoat.2013.01.036
IF: 4.865
2013-01-01
Surface and Coatings Technology
Abstract:Two high-entropy alloy nitride films, (Al23.1Cr30.8Nb7.7Si7.7Ti30.7)N50 and (Al29.1Cr30.8Nb11.2Si7.7Ti21.2)N50, were designed and prepared by reactive magnetron sputtering. The influences of substrate bias (from −50V to −150V) on chemical composition, microstructure, and mechanical properties of the deposited films were investigated. All the films have face-centered cubic NaCl-type structure. The (Al23.1Cr30.8Nb7.7Si7.7Ti30.7)Nx films deposited at −100V exhibit the highest hardness of 36.1GPa, and the (Al29.1Cr30.8Nb11.2Si7.7Ti21.2)Nx films have its maximum hardness of 36.7GPa at a substrate bias of −150V. Both (Al23.1Cr30.8Nb7.7Si7.7Ti30.7)Nx and (Al29.1Cr30.8Nb11.2Si7.7Ti21.2)Nx films have outstanding oxidation resistance at 900°C.
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