Effects of substrate bias on the structure and mechanical properties of (Al 1.5 CrNb 0.5 Si 0.5 Ti)N x coatings

wanjui shen,minghung tsai,yeeshyi chang,jienwei yeh
DOI: https://doi.org/10.1016/j.tsf.2012.06.002
IF: 2.1
2012-01-01
Thin Solid Films
Abstract:(Al1.5CrNb0.5Si0.5Ti)Nx high-entropy nitride coatings were designed and investigated in this study. Nitride coatings are deposited under a sufficient amount of nitrogen at 415°C on Si by direct current magnetron reactive sputtering from a non-equimolar Al1.5CrNb0.5Si0.5Ti high-entropy alloy target. The effects of substrate bias (Vs) on film structure and mechanical properties are studied. All these coatings have a single NaCl-type face-centered cubic structure and nearly stoichiometric ratio of (Al1.5CrNb0.5Si0.5Ti)50N50. A distinct refinement of microstructure of the films is observed when Vs varies from 0V to −100V. Typical columnar structure transits into a dense and featureless structure and grain size decreases from 70nm to 5nm. Similar refinement remains at larger bias(−150 or −200V). At the same time, the residual compressive stress increases from near zero to −3.9GPa at −150V and then decreases to −3.2GPa at −200V. The hardness increases from 12GPa at 0V, peaks at 36GPa at −100V, and then decreases to 26GPa at −200V. The structural evolution strengthening mechanism are discussed and compared with equimolar high-entropy nitrides.
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