Influence of substrate bias, deposition temperature and post-deposition annealing on the structure and properties of multi-principal-component (AlCrMoSiTi)N coatings

Hui-Wen Chang,Ping-Kang Huang,Jien-Wei Yeh,Andrew Davison,Chun-Huei Tsau,Chih-Chao Yang

DOI: https://doi.org/10.1016/j.surfcoat.2007.12.014

IF: 4.865

2008-01-01

Surface and Coatings Technology

Abstract:Nitride films are deposited from a single equiatomic AlCrMoSiTi target by reactive DC magnetron sputtering. The influence of the substrate bias and deposition temperature on the coating structure and properties are investigated. The bias is varied from 0 to −200 V while maintaining a substrate temperature of 573 K. And the temperature is changed from 300 to 773 K whilst maintaining a substrate bias of −100 V. From X-ray diffraction analysis, it is found that all the as-deposited coatings are of a single phase with NaCl-type FCC structure. This is attributed to the high mixing entropy of AlN, CrN, MoN, SiN, and TiN, and the limited diffusion kinetics during coating growth. Specific aspects of the coating, namely the grain size, lattice constant and compressive stress, are seen to be influenced more by substrate bias than deposition temperature. In fact, it is possible to classify the deposited films as large grained (~15 nm) with a reduced lattice constant (~4.15 Å) and low compressive residual stresses for lower applied substrate biases, and as small grained (~4 nm) with an increased lattice constant (~4.25 Å) and high compressive residual stresses for applied biases of −100 V or more. A good correlation between the residual stress and lattice constant under various deposition conditions is found. For the coatings deposited at −100 V, and at temperatures above 573 K, the hardness could attain to the range of 32 to 35 GPa.