Structure, Composition and Mechanical Properties of Reactively Sputtered (tivcrtaw)nx High-Entropy Films

Yuchun Tu,Xuan Li,Jianlong Zhao,Yue Yuan,Benyuan Cheng,Zhipeng Xie,Junjian Ye,Wei Wang,Xiang Huang
DOI: https://doi.org/10.2139/ssrn.4084615
2022-01-01
Abstract:Nitride and metallic films multi-element (TiVCrTaW)N x high-entropy alloy were deposited on silicon wafers by pulse DC magnetron sputtering. To tune the microstructure and mechanical properties of the films, different nitrogen gas flow ratios were utilized. The concentration of nitrogen approached the stoichiometric composition at R N ≥33.3%. The alloy film deposited in pure argon exhibited a BCC structure and a very smooth surface, while an FCC with strong (111) or (200) orientation and granular surface morphologies was observed in those films prepared with introduction of nitrogen gas. The (TiVCrTaW)N x films exhibited enhanced hardness upon the addition of nitrogen mainly due to the solid-solution strengthening effect. The nitride film achieved the highest hardness and Young’s modulus of 38 GPa and 350 GPa, respectively. The results show that the deposition atmosphere is a critical growth parameter for tunning the structure and the properties of (TiVCrTaW)N x high-entropy films with potential applications in harsh environments.
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