Growth of CrN Films by Plasma Ion Implantation & Deposition Based on High Power Pulsed Magnetron Discharge

Zhongzhen Wu,Xiubo Tian,Zeming Wang,Chunzhi Gong,Shiqin Yang

DOI: https://doi.org/10.3969/j.issn.1672-7126.2011.04.15

2011-01-01

Abstract:The CrN films were grown by high power pulsed magnetron discharge plasma ion implantation deposition on stainless steel substrates. The impacts of the deposition conditions, especially the gas flow-rate ratio of argon and nitrogen, on the CrN films were studied. Its microstructures and mechanical properties were characterized with X-ray diffraction, scanning electron microscopy and conventional mechanical probes. The results show that the smooth, compact CrN films with strong interface adhesion significantly improve the mechanical properties of the substrates. For instance, the highest critical load in evaluating the interfacial adhesion was 68 N; the hardness increased to 23.6 GPa, 4.7 times of the substrates. Moreover, the CrN coated surfaces display lower friction coefficient, 0.5, but higher wear resistance than the control sample. The corrosion potential increases by 0.32 V, but the corrosion current decreases by an order of magnitude.