A Simplified Microfabrication Technology For Production Of Glass Microfluidic Chips

Xf Yin,S Hong,Zl Fang
DOI: https://doi.org/10.3321/j.issn:0253-3820.2003.01.028
2003-01-01
Abstract:This paper describes a procedure that makes it possible to design and fabricate microfluidic chips on glass substrates in a conventional chemical laboratory. A network of microfluidic channels was designed with a CAD program (Adobe Illustrator 8.0). This design was transferred onto a sheet of Konica film by a high-resolution laser setter. The Konica film was used as a mask for ultraviolet exposure in the photolithographic procedure. A 145 nm. Cr/570 nm Az - 1805 photoresist layer on the commercially available glass substrate was used as a sacrificial mask, which was effective for etching with 1 mol/L HF + 1 mol/L NaF at 50degreesC. The etching rate was 2 mum/min. After rigorously cleaning the etched and blank substrate,the two substrates were brought into close contact with each other in a flow of high purity water to avoid contamination from dust-particles in laboratory environment. Thus, the bonding quality was significantly improved. Using these improved fabrication techniques, high-quality microfluidic: chips. with channel-densities of 70/cm (70 mum channel width) can be routinely obtained in the conventional laboratory. The chips have been used successfully for the separation of amino acids and for polymerase chain reaction ( PCR) amplification.
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