Structural characteristic of cubic GaN nucleation layers on GaAs(0 0 1) substrates by MOCVD

X.H Zheng,Z.H Feng,Y.T Wang,W.L Zheng,Q.J Jia,X.M Jiang,Hui Yang,J.W Liang
DOI: https://doi.org/10.1016/S0022-0248(02)01391-X
IF: 1.8
2002-01-01
Journal of Crystal Growth
Abstract:The structural characteristic of cubic GaN (C-GaN) nucleation layers on GaAs(001) substrates by metalorganic chemical vapor deposition was in detail investigated first by X-ray diffraction (XRD) measurements, using a Huber five-circle diffractometer and an intense synchrotron X-ray source. The XRD results indicate that the C-GaN nucleation layers are highly crystallized. Φ scans and pole figures of the (111) reflections give a convincing proof that the GaN nucleation layers show exactly cubic symmetrical structure. The GaN(111) reflections at 54.74° in χ are a measurable component, however (002) components parallel to the substrate surface are not detected. Possible explanations are suggested. The pole figures of {101̄0} reflections from H-GaN inclusions show that the parasitic H-GaN originates from the C-GaN nucleation layers. The coherence lengths along the close-packed 〈111〉 directions estimated from the (111) peaks are nanometer order of magnitude.
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