Study on a-Plane GaN Thin Films Growth by MOCVD and Its r-Plane Anisotropy

Li Yi,Xie Zili,Liu Bin,Fu Deyi,Zhang Rong,Zheng Youliao
2008-01-01
Abstract:The non-polar a-plane GaN thin films on r-plane sapphire substrate were grown directly without a buffer layer by MOCVD.The HR XRD characterized crystal structural resulted the films were in-plane anisotropic.The lateral correlation along the [0001] and[100] direction were 41.9 nm and 14.8 nm respectively by using RSMs,and it was one reason for in-plane anisotropy.The difference in the number of nitrogen dangling bonds at the step edge for the two-crystal directions causing a difference in migration length of gallium adatoms was another reason for in-plane anisotropy.The AFM results show that GaN thin films are smooth surface with a RMS roughness of 3.9 nm.Wavy stripe along the[0001] direction can be observed to indicate the a-plane GaN in-plane anisotropy again.
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