Abstract:Crystalline carbon nitride films have been synthesized on polycrystalline Ni substrates by a microwave plasma chemical vapour deposition technique, using a mixture of N2, CH4 and H2 as precursor. Scanning electron microscopy shows that the film consisted of perfect crystals of short and long hexagonal bars, tetragonal bars and irregular particles. From the X-ray photoelectron spectroscopy (XPS) data, a maximum N/C ratio of 1.0 was achieved in the films. The XPS spectra of the film typically showed three peaks in the C 1s core spectrum (centered at 284.78, 285.94, and 287.64 eV) and two peaks in the N 1s core level spectrum (centered at 398.35 and 400.01 eV). This indicates that there are two types of C–N bonds; N is bonded to sp2- or sp3-coordinated C atoms in the as-deposited film. The X-ray diffraction pattern indicates that the film is composed of α-, β-, pseudocubic, graphitic C3N4 and an unidentified phase. A series of intense sharp Raman peaks were observed in the range of 100–1500 cm−1. These peaks match well with the calculated Raman frequencies of α- and β-C3N4, revealing the formation of α- and β-C3N4 phase.

Synthesis and Characterization of C3N4 Hard Films

Synthesis of Crystalline C3N4 by MPCVD

Deposition of crystalline C3N4 films via microwave plasma chemical vapour deposition

C3N4 Film Deposited by Synchrotron Radiation Assisted CVD

Crystalline Β-C3n4 Synthesized by MPCVD

PREPARATION OF CUBIC C 3 N 4 THIN FILMS BY LOW-PRESSURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

Investigation of carbon nitride films by cathodic arc evaporation

Crystalline Carbon Nitride Films Prepared by Microwave Plasma Chemical Vapour Deposition

Formation of Cubic C3N4 Thin Films by Plasma Enhanced Chemical Vapor Deposition

Carbon Nitride Films Synthesized By Combined Ion-Beam And Laser-Ablation Processing

Cn(X) Films Deposited By Laser-Ablation Of Graphite Under Low-Energy Nitrogen-Ion Beam Bombardment

STRUCTURAL CHARACTERIZATION OF THE CN FILMS

Growth of CN Films by Reactive Ionized Cluster Beam Deposition

Preparation and Analysis of Si3N4 Film

X-ray diffraction analysis on the RF-CVD deposited carbon nitride films

High-Temperature High-Pressure Synchrotron X-Ray Diffraction Study Of C3n4

Optical & Electronic Properties of Carbon Nitride Thin Films

Formation of Β-C3n4 Phase in C-N Films Deposited by Reactive Ionized Cluster Beam Method

Studies of Cn<sub>1</sub> Films Deposited by Ion-Beam-Assisted Laser Ablation of Graphite

Ion-beam-assisted Deposition of CNx Films

Structure and Properties of Carbon Nitrogen Films Synthesized by Ion Beam-Assisted Deposition