Abstract:The conventional surface x-ray diffraction method [1] allows us to determine atomic arrangements of crystal surfaces and interfaces.While x-ray diffraction intensities distributed within a reciprocal lattice space are usually measured with a finetooth comb using the method, an overall image of the diffraction intensity profile is difficult to get until after such lengthy and time consuming measurement is completed.We proposed x-ray reciprocal-lattice space imaging method (X-ReSI) for straightforward understanding of 1D nanostructures such as NiO nanowires [2].The X-ReSI is a single-exposure diffraction technique which records the reciprocallattice pattern of a fixed crystalline nanostructure using a 2D detector.The fundamental idea behind the method is that the reciprocal lattice of 1D or 2D structures are an array of sheets or rods, respectively.Thus the reciprocal-lattice space can be recorded for a fixed sample with a 2D x-ray detector fixed.The typical exposure time is a few seconds to a few minutes using the 3rd generation x-ray source.We applied the method to structural evaluation of Bi nanolines being 1/8 monolayers in coverage on average.The results of the application reveal that Bi nanolines embeded in Si was found to have a 2 x n superstructure having Bi dimer bonds [3].On the other hand line structures in samples capped with an amorphous Si layer and having no cap layers still remained with a non-detectable amount of the 2 x n atomic structures.Other applications are structural determination of a Bi4Ti3O12 thinfilm and in-situ observation of a Au electrode in H2SO4.

Development Of Synchrotron Radiation X-Ray Grazing Incident Diffraction Method

Growth and Microstructures of High Density Ge Quantum Dots on SiO_2 Layers

A Study of Rheed Pattern from the Epitaxial Growth of Si-Ge Crystal

Grazing-incidence Small Angle X-Ray Scattering Studies of Nanoscale Polymer Gratings

Study of Semiconductor Super Thin Heterostructures with Synchrotron Radiation X-Ray Standing Wave Technique

Strains in Si Substrate Induced by Formation of Ge Islands

Study of Si Caplayer Influence on Microstructure of Ge/Si Quantum Dots by Grazing Incident X-Ray Diffraction

GeSi Quantum Dots Studied by Grazing Incidence Small Angle X-ray Scattering

Depth profiles of the interfacial strains of Si 0.7 Ge 0.3 /Si using three-beam Bragg-surface diffraction

Ge-Dot/Si Multilayered Structures Through Ni-Induced Lateral Crystallization

Projective Quasiparticle Interference of a Single Scatterer to Analyze the Electronic Band Structure of ZrSiS

The performance of X-ray diffraction and scattering endstation in NSRL and its typical applications in material science

Reflection Surface X-Ray Diffraction Patterns: K-Space Images

Single-mode Dynamic X-ray Diffraction for Si and Si Nanowires on Si

Structural Characteristics of Self-Assembled-Ge/Si Quantum Dot Superlattices

A SMALL-ANGLE X-RAY SCATTERING STATION AT BEIJING SYNCHROTRON RADIATION FACILITY

Study of Ge Thin Heterostructures by Synchrotron Radiation X-Ray Reflection

Studies of Fesi2/Si Quantum Dot Nano-Structures by X-Ray Bragg-Surface Diffractions (Bsd)

Monitoring growth with X-ray diffraction

Realizing In-Plane Surface Diffraction by X-Ray Multiple-Beam Diffraction with Large Incidence Angle

Investigation on Ge Surface Diffusion Via Growing Ge Quantum Dots on Top of Si Pillars