Studies of Fesi2/Si Quantum Dot Nano-Structures by X-Ray Bragg-Surface Diffractions (Bsd)

Chia-Hung Chu,Yi-Wei Tsai,Wen-Chin Sun,Shih-Lin Chang
DOI: https://doi.org/10.1107/s0108767308082342
2008-01-01
Abstract:The conventional surface x-ray diffraction method [1] allows us to determine atomic arrangements of crystal surfaces and interfaces.While x-ray diffraction intensities distributed within a reciprocal lattice space are usually measured with a finetooth comb using the method, an overall image of the diffraction intensity profile is difficult to get until after such lengthy and time consuming measurement is completed.We proposed x-ray reciprocal-lattice space imaging method (X-ReSI) for straightforward understanding of 1D nanostructures such as NiO nanowires [2].The X-ReSI is a single-exposure diffraction technique which records the reciprocallattice pattern of a fixed crystalline nanostructure using a 2D detector.The fundamental idea behind the method is that the reciprocal lattice of 1D or 2D structures are an array of sheets or rods, respectively.Thus the reciprocal-lattice space can be recorded for a fixed sample with a 2D x-ray detector fixed.The typical exposure time is a few seconds to a few minutes using the 3rd generation x-ray source.We applied the method to structural evaluation of Bi nanolines being 1/8 monolayers in coverage on average.The results of the application reveal that Bi nanolines embeded in Si was found to have a 2 x n superstructure having Bi dimer bonds [3].On the other hand line structures in samples capped with an amorphous Si layer and having no cap layers still remained with a non-detectable amount of the 2 x n atomic structures.Other applications are structural determination of a Bi4Ti3O12 thinfilm and in-situ observation of a Au electrode in H2SO4.
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