Room-temperature photoluminescence of thermally oxidized Si1-x-yGexCy thin films on Si (100) substrates

Xuemei Cheng,Youdou Zheng,Xiabing Liu,Lan Zang,Shunming Zhu,Ping Han,Zhiyun Luo,Ruolian Jiang
2000-01-01
Abstract:Intensive photoluminescence of thermally oxidized Si1-x-yGexCy thin films on Si (100) substrates are first observed at room temperature. The Si1-x-yGexCy thin films being rich in Ge and C content are grown on Si substrate by Plasma Enhanced Chemical Vapor Deposition (PECVD) and then wet oxidized for 20 minutes at 800°C respectively. Photoluminescence spectra of the samples are measured at room temperature and under 250 nm excitation. Two photoluminescence bands with the peaks at -370 nm and 396 nm are observed in the 800°C oxidized samples, and only one photoluminescence centered at -396 nm is observed in the 1100°C oxidized samples. The 396 nm band is attributed to the defects O-Si-O or O-Ge-O in the oxidized films, while the 370 nm band is consistent to C in the films.
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