Abstract:Boron and nitrogen compounds are added in the acetone/hydrogen gas mixture to deposit hot filament chemical vapor deposition (HFCVD) diamond films on the cobalt cemented tungsten carbide (WC–Co) substrate under the pressure of 1–4 kPa. The as‐deposited diamond films are characterized by field emission scanning electron microscope (FESEM), atomic force microscopy (AFM), X‐ray diffraction (XRD) spectroscopy and Raman spectroscopy. The results reveal that the surface morphology, growth rate, structure and quality of the diamond films vary with the pressure and the type of the impurity addition. The diamond grains tend to develop into the nanometer scale with the decrease of the pressure. However, adding of boron or nitrogen impurities in the gas mixture will weaken the nanocrystallization effect by reducing the carbon supersaturation. Density functional theory (DFT) calculations indicate that co‐adsorption of B and N containing radicals can favor the adsorption of CH3 on diamond (100) surface. Thus, at low pressure of 1 kPa, large grained cubic (100) facet diamond rather than typical nanometer diamond is produced for B–N co‐addition gas mixture. The present results appear to be useful to efficiently synthesize high quality doped diamonds with desirable properties for mechanical application. Copyright © 2015 John Wiley & Sons, Ltd.

Low Pressure Growth of Diamond Films under Fluorine Addition

Phase diagrams for low pressure diamond synthesis in carbon-hydrogen-fluorine system

Evaluation of the Growth Condition of Chemical Vapour Deposition Diamond under Fluorine Addition

Phase diagrams in C-H-N system for low pressure CVD diamond growth

Phase Diagrams for Cvd Diamond Deposition from Halogen-Containing Gas Phase

Calculated phase diagrams for activated low pressure diamond growth from C–H, C–O, and C–H–O systems

Low-Temperature Growth Of Ultra-Thin Nano-Crystalline Diamond Films By Hfcvd In A Ch4/H-2 Mixture

Effects of Fluorine Addition on Driving Force for CVD Diamond Growth

Series of non-equilibrium stationary phase diagrams on diamond growth under different pressures of C-H system

Thin Film Growth Conditions for Cvd Diamond under Low Pressure

Phase diagram calculation of diamondgrowth from low pressure gases

Calculation of diamond phase diagrams in the CO/H2 system under low pressure

Effect of pressure on nanocrystalline diamond films deposition by hot filament CVD technique from CH4/H2 gas mixture

Deposition conditions for CVD diamond films under low pressure with nitrogen addition

Thermodynamics of diamond film deposition at low pressure from chlorinated precursors

Effect of Pressure on the Growth of Boron and Nitrogen Doped HFCVD Diamond Films on WC–Co Substrate

Calculation of phase diagram for diamond growth in C-H-Cl system

C-H system low-pressure diamond growth condition influenced by activation temperature

Phase diagrams for activated CVD diamond growth

Effects of temperature and pressure on CVD diamond growth from the C-H-O system

A Study of the Pressure-Temperature Conditions for Diamond Growth