Phase Diagrams for Cvd Diamond Deposition from Halogen-Containing Gas Phase

ZJ Liu,DW Zhang,JY Zhang,YZ Wan,JT Wang
DOI: https://doi.org/10.1016/s0040-6090(98)01329-7
IF: 2.1
1999-01-01
Thin Solid Films
Abstract:Thermodynamics of diamond film deposition at low pressure from C (carbon)–H (hydrogen)–X (halogen) system has been studied according to a non-equilibrium thermodynamic coupling model proposed by Wang in previous papers. Projective and sectional temperature–gas composition phase diagrams of diamond growth are obtained. Diamond growth regions, which represent the constraints of temperature, pressure and gas composition suitable for diamond growth, are predicted in our phase diagrams. Diamond growth regions agree with many experimental data reported in the literature. Thermodynamic analyses show that the substrate temperature range suitable for diamond film deposition moves towards lower temperature with increasing X addition, and becomes narrower. The effect of system pressure on the diamond growth region is also discussed.
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