Abstract:Carbon nitride films were deposited on Co/Ni-covered Si(100) wafers at room temperature using a dc glow discharge plasma beam deposition method. The glow discharge has been carried out in a mixed gas of nitrogen and methane in different relative proportions and has maintained stable in an glow operating pressure around 30Torr. Scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Raman spectroscopy were carried out to investigate morphology, composition, structure and crystallinity of the as-deposited films. In scanning electron microscopy images, the as-deposited films consist of crystallites with an average size of about 20–30nm, and an interesting cauliflower structure is found in the center of a prepared sample. The X-ray diffraction results indicate that β- and graphitic-C3N4 crystallites and CNx or carbon nanotubes exist in the as-deposited films. The X-ray photoelectron spectroscopy results show that the [N]/[C] ratios are 0.34–0.46 and the peak shapes and intensities in the N 1s and C 1s regions are similar to those previously reported by our research group using the atom-beam assisted pulsed laser deposition method. The Raman spectra show two separated characteristic bands: a disordered D band (around 1323cm−1) that indicates the presence of C3N4 components, and a graphitic G band (around 1593cm−1). The impacts of the substrate temperatures, nitrogen/methane pressure ratios and Co/Ni layer thicknesses on the properties of the as-deposited films are discussed.

Observations of Laue pattern and stability of beta -C3N 4 grains

Investigation of carbon nitride films by cathodic arc evaporation

Synthesis of Carbon Nitride Films by Arc-Heated Atomic Nitrogen Beams Assisted Pulsed Laser Ablation

Carbon Nitride Films Synthesized By Combined Ion-Beam And Laser-Ablation Processing

Characteristics of Carbon Nitride Films Synthesized by Single-Source Ion Beam Enhanced Deposition System

Raman Spectra Of Nanocrystalline Carbon Nitride Synthesized On Cobalt-Covered Substrate By Nitrogen-Atom-Beam-Assisted Pulsed Laser Ablation

Nitrogen Ion Implantation into the Amorphous CN Films Prepared with Ion Beam Assisted Deposition

Synthesis of C3N4+ by the Combination of Laser Ablation of Graphite and N2 Molecular Beam

Ion-beam-assisted Deposition of CNx Films

Electronic and Mechanical-Properties of Carbon Nitride Films Prepared by Laser-Ablation Graphite under Nitrogen Ion-Beam Bombardment

Carbon Nitride Films Synthesized By Nh3-Ion-Beam-Assisted Deposition

Crystalline Carbon Nitride Film Synthesized by Ion Beam Assisted Magnetron Sputtering and Thermal Annealing in Nitrogen Gas

Structure and Properties of Carbon Nitrogen Films Synthesized by Ion Beam-Assisted Deposition

Formation of Β-C3n4 Phase in C-N Films Deposited by Reactive Ionized Cluster Beam Method

Ion beam synthesis of C-N crystalline film and its analysis

High-Temperature High-Pressure Synchrotron X-Ray Diffraction Study Of C3n4

Synthesis of Crystalline Carbon Nitride by Chemical Vapor Deposition

X-ray diffraction analysis on the RF-CVD deposited carbon nitride films

Investigations on Structural Properties of Carbon Nitride Films Synthesized by Reactive Ionized Cluster Beam Deposition

Synthesis of Nanocrystalline Carbon Nitride Films by Glow Discharge Plasma Beam Deposition

Field Emission Properties of Nanocomposite Carbon Nitride Films