A proper approach to characterize retention-after-cycling in 3D-Flash devices

Fengying Qiao,Antonio Arreghini,Pieter Blomme,Geert Van Den Bosch,Liyang Pan,Jun Xu,Jan F. Van Houdt
DOI: https://doi.org/10.1109/ICMTS.2013.6528169
2013-01-01
Abstract:We propose a procedure to evaluate retention-after-cycling in 3D-Flash devices. Proper comparison of retention transients requires the initial charging level to be as close as possible, but P/E cycling results in serious ID-VG degradation, preventing a consistent extraction of the threshold voltage. We introduce a test where a relaxation phase is added after cycling, consisting in baking samples for 24 hours at 200°C. This relaxation appears to anneal interface traps and to remove locally accumulated charge, restoring similar shape of ID-VG curves before and after cycling, hence allowing a proper comparison of retention of fresh and stressed devices.
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