Flexible Dual-Gate Oxide TFTs Gated by Chitosan Film on Paper Substrates

Wei Dou,Liqiang Zhu,Jie Jiang,Qing Wan
DOI: https://doi.org/10.1109/led.2012.2231661
IF: 4.8157
2013-01-01
IEEE Electron Device Letters
Abstract:Low-voltage flexible dual-gate indium-tin-oxide-based thin-film transistors (TFTs) are self-assembled on SiO2-covered paper substrates by one shadow mask diffraction method. Solution-processed chitosan gate dielectric films have a large gate specific capacitance (5.8 mu F/cm(2)) due to the electric-double-layer effect. The subthreshold swing, drain-current on/off ratio, and field-effect mobility are estimated to be 80 mV/dec, 4 x 10(6), and 9.3 cm(2)/V . s, respectively. Low-voltage operation mechanism and threshold voltage modulation of such dual-gate paper TFTs are investigated.
What problem does this paper attempt to address?