Carrier Sign Reversal in Amorphous Silicon Ruthenium Thin Films Deposited by Co-Sputtering

Anran Guo,Jian He,Chong Wang,Wei Li,Yadong Jiang
DOI: https://doi.org/10.1117/12.2052223
2013-01-01
Abstract:We report on the co-sputtering growth of amorphous silicon ruthenium (a-Si1-xRux) thin films, in which carrier sign reversal is observed by Hall measurement with increasing Ru concentration. High conductivity and suitable temperature coefficient of resistivity (TCR) are obtained, respectively. Raman spectroscopy reveals the degradation of amorphous network, which is caused by doped Ru atoms due to the different size and eletronegativity between Si and Ru atoms. The Hall effect anomaly will be related to the impurities and disordered structure.
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