Structural Variation and Its Influence on the 1/f Noise of A-Si1-xrux Thin Films Embedded with Nanocrystals

Chong Wang,Hao Zhong,Eddy Simoen,Xiang-Dong Jiang,Ya-Dong Jiang,Wei Li
DOI: https://doi.org/10.1088/0256-307x/36/2/028101
2019-01-01
Abstract:The structural variation and its influence on the 1/f noise of a-Si1-xRux thin films are investigated by Raman spectroscopy, transmission electron microscopy, and low frequency noise measurement. The Ru atoms are introduced into the amorphous silicon thin films by rf magnetron co-sputtering. Ru2Si nanocrystals are found in the as-deposited samples. It is shown that the 1/f noise of the films can be reduced by a slight doping with Ru atoms. Moreover, both the microstructure and the 1/f noise performance of a-Si1-xRux thin films could be improved through a high-temperature annealing treatment.
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