Fabrication of single-mode ridge SU-8 waveguides based on inductively coupled plasma etching

Xibin Wang,Jie Meng,Yuanbin Yue,Jian Sun,Xiaoqiang Sun,Fei Wang,Daming Zhang
DOI: https://doi.org/10.1007/s00339-012-7514-1
2013-01-01
Applied Physics A
Abstract:In this paper, a systematic study has been performed for the etching of negative photoresist SU-8 2005 using inductively coupled plasma. The etching rate, vertical profile, surface and sidewall roughness of the waveguide were investigated as a function of the chamber pressure, the bias power, the antenna power, the ratio of flow rate of Ar to O 2 , and the etching time. The etching parameters were studied in detail and optimized to minimize the surface roughness in etched areas. Ridge MZI waveguides with SU-8 2005 were fabricated under the optimized etching conditions, resulting in smooth and almost vertical patterns. The waveguides showed single-mode propagation at 1550 nm wavelength and low propagation loss of less than 1.565 dB/cm, which was similar to the waveguides fabricated by the wet-etching technique.
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