Abstract:environments. As a result, we are developing chemical sensors within integrated microfluidic systems for sensitive and selective detection of these pollutants. Our approach is to combine established chemical sensing strategies with microfluidic structures, especially in plastic devices, to achieve a total heavy metal analysis system. In this regard, the combination of three complementary techniques-optical waveguide spectroscopy, electrochemistry and chemical partitioning offers the required selectivity and sensitivity essential for many environmental samples. On-chip optical waveguide spectroscopy promises to yield the necessary high sensitivity but relies on fabrication of optical structures with a material of appropriate refractive index, optical quality, and chemical stability by methods consistent with established fabrication methods. SU-8, the epoxy-based negative photoresist, appears to satisfy these requirements and, thus, has become one of our candidate materials for waveguide fabrication on plastic microchips. Although the SU-8 has been previously used for waveguide fabrication, its optical properties and more specifically the influence of processing conditions on resultant optical properties have not been thoroughly characterized. This work presents an evaluation of SU-8-based multimode waveguides on glass and plastic substrates. Optical constants of waveguides have been characterized by spectroscopic ellipsometric and prism coupling techniques. Additionally, using the latter method, evaluation of propagation losses of various structures with different thicknesses has been made. Ellipsometric and prism coupling measurements gave comparable refractive indices for variously cured SU-8 waveguide materials. Prism coupling analyses proved to be more useful for analysis of the many SU-8 waveguide structures fabricated in the thickness range of 5 to 75 mu m.

Optimized Inductively Coupled Plasma Etching for Poly(Methyl-Methacrylate-Glycidly-Methacrylate) Optical Waveguide

Improvement of ICP etching process for reducing the surface roughness of SiO2 optical waveguides

Inductively Coupled Plasma Etching to Fabricate Sensing Window for Polymer Waveguide Biosensor Application

Structure Optimization of Polymeric Mach-Zehnder Rib Waveguide

Fabrication Techniques For Polymer/Si Optical Waveguide

Fabrication and Performance Evaluation of Polymer Waveguides for Optical Printed Circuit Board Applications

Effect of reactive ion etching process on simulation of polymeric arrayed waveguide grating multiplexers

All-polymeric planar waveguide devices based on a gas-assisted thermal imprinting technique

Design of Mach-Zehnder Waveguide Based on Organic Polymers

Optimization of Plasma Etching Parameters and Mask for Silica Optical Waveguides

Fabrication of single-mode ridge SU-8 waveguides based on inductively coupled plasma etching

Fabricated Technology for Polymer/si Arrayed Waveguide Grating

Optimization of waveguide fabrication processes in lithium-niobate-on-insulator platform

Investigation On Roughness-Induced Scattering Loss Of Small-Core Polymer Waveguides For Single-Mode Optical Interconnect Applications

Characterization of SU-8 optical multimode waveguides for integrated optics and sensing on microchip devices

Laser Annealing of SiO2 Film Deposited by ICPECVD for Fabrication of Silicon Based Low Loss Waveguide

Study on Deep Reactive Ion Etching of Commerical Polymethlmethacrylate Film

Practical Evaluation of Polymer Waveguides for High-Speed and Meter-Scale On-Board Optical Interconnects

Optimization of the Mach-Zehnder modulator using polymer asymmetric rib waveguide

Influence of Etching Parameters on Sidewall Roughness of Silicon Based Waveguide Etched by Inductively Coupled Plasma

Fabrication techniques for colymer/Si optical waveguide