Abstract:Optical waveguides fabricated in single crystals offer crucial passive/active optical components for photonic integrated circuits. Single crystals possess inherent advantages over their amorphous counterpart, such as lower optical losses in visible‐to‐mid‐infrared band, larger peak emission cross‐section, higher doping concentration. However, the writing of Type‐I positive refractive index modified waveguides in single crystals using femtosecond laser technology presents significant challenges. Herein, we introduce a novel femtosecond laser direct writing technique that combines slit‐shaping with an immersion oil objective to fabricate low‐loss Type‐I waveguides in single crystals. This approach allows for precise control of waveguide shape, size, mode‐field and refractive index distribution, with a spatial resolution as high as 700 nm and a high positive refractive index variation on the order of 10−2, introducing new degrees of freedom to design and fabricate passive/active optical waveguide devices. As a proof‐of‐concept, we successfully produced a 7 mm‐long circular‐shaped gain waveguide (∼10 μm in diameter) in an Er3+‐doped YAG single crystal, exhibiting a propagation loss as low as 0.23 dB/cm, a net gain of ∼3 dB and a polarization‐insensitive character. The newly‐developed technique is theoretically applicable to arbitrary single crystals, holding promising potential for various applications in integrated optics, optical communication, and photonic quantum circuits. This article is protected by copyright. All rights reserved

Void-Filling and Loss Reduction in PECVD Silica Waveguide Devices Using Boron–Germanium Codoped Upper Cladding

Rib and strip chalcogenide waveguides based on Ge-Sb-Se radio-frequency sputtered films

Design and Optimization of A Silica Waveguide Based Visible Etched Diffraction Grating with Uniform Loss

Germanium-On-Silicon Nitride Waveguides for Mid-Infrared Integrated Photonics

Design and fabrication of 1 × 32 silica-based arrayed waveguide grating

Optical loss of bandgap shifted InGaAsP/InP waveguide using argon plasma-enhanced quantum well intermixing

Different Index Contrast Silica-on-silicon Waveguides by PECVD

Manufacturing of selectively buried channel waveguide on glass substrate

Fabrication of Si/Si1-Xgex Waveguide Wdm Components

Design of Synthesized DBRs for Long-Wavelength InP-Based Vertical-Cavity Surface-Emitting Lasers

Mitigating waveguide loss in Ge-Sb-Se chalcogenide glass photonics

3D Laser Writing of Low‐Loss Cross‐Section‐Variable Type‐I Optical Waveguide Passive/Active Integrated Devices in Single Crystals

Deep UV photolithography enhanced geometric homogeneity for low loss photonic crystal waveguides

Fabricating Low Loss Waveguides over a Large Depth in Glass by Temperature Gradient Assisted Femtosecond Laser Writing.

Laser Annealing of SiO2 Film Deposited by ICPECVD for Fabrication of Silicon Based Low Loss Waveguide

Reduction of Sidewall Roughness, Insertion Loss and Crosstalk of Polymer Arrayed Waveguide Grating Using Vapor-Redissolution Technique

Low-loss optofluidic waveguides in fused silica enabled by spatially shaped femtosecond laser assisted etching combined with carbon dioxide laser irradiation

Erbium-ytterbium co-doped aluminium oxide waveguide amplifiers fabricated by reactive co-sputtering and wet chemical etching

Optimized Inductively Coupled Plasma Etching for Poly(Methyl-Methacrylate-Glycidly-Methacrylate) Optical Waveguide

Hollow-core-waveguides Using Adiabatically Chirped High-Contrast-gratings for a >10× Loss Reduction