Effect of reactive ion etching process on simulation of polymeric arrayed waveguide grating multiplexers

Zheng-kun QIN,Fei HE,Chun-ling LIU,Chun-sheng MA

2011-01-01

Abstract:A polymer Arrayed Waveguide Grating (AWG) multiplexer has been designed and fabricated by using the poly (2, 3, 4, 5, 6-pentafluorostyrene-co-glycidylmethacrylate) (PFS-co-GMA). In the fabrication of the polymeric AWG device, the cross of the channels and the arrayed waveguides exhibit smooth trapezoid cross-sections instead of originally designed rectangular ones after the reactive ion etching. In this paper, for the technological level and the characteristics of the trapezoid cross-sections, a new analysis method, referred as equivalent energy flow method, is presented for analyzing the transmission characteristics of AWG. The central wavelength of the device originally designed is 1 550.918 nm, and the measured central wavelength is 1 550.826 nm, the spectral shift is 0.092 nm. By using this technique, the computed results show that the spectral shift is 1 550.872 nm, the spectral shift is reduced to 0.046 nm. This indicates that the proposed equivalent energy flow method has satisfactory accuracy and reasonability.